一种扩散面水膜保护湿法刻蚀工艺

Water film protection wet etching process for diffusing surface

Abstract

本发明涉及太阳能电池制造过程中的链式湿法刻蚀工艺,特别是一种扩散面水膜保护湿法刻蚀工艺。该工艺首先在待刻蚀的硅片扩散面形成一层水膜保护层,该水膜保护层在后续刻蚀时用来保护硅片的扩散面,然后该硅片漂浮在刻蚀药液上进行常规湿法刻蚀。本发明利用液体的表面张力在硅片表面形成水膜保护层,不仅可以去除现有湿法刻蚀工艺中产生的多余刻蚀区域,增加PN结的有效受光面积,提高光电转换效率,而且可消除因刻蚀槽内气泡炸裂刻蚀药液飞溅、槽体上方凝结的刻蚀药液液滴滴落、排风不稳定、流量异常等问题,造成扩散面被刻蚀药液破坏,最终降低太阳能电池的各种外观不良片、电性能失效片的产生比例。
The invention relates to a chained wet etching process during manufacturing of solar batteries, in particular to a water film protection wet etching process for a diffusing surface. The process comprises the following steps of: firstly, forming a water film protection layer on the diffusing surface of a silicon slice to be etched, wherein the water film protection layer is used for protecting the diffusing surface of the silicon slice during subsequent etching; and performing the conventional wet etching on the silicon slice floating on an etching liquid medicine. In the process, the water film protection layer is formed on the surface of the silicon slice by using surface tension of the liquid, so residual etching regions produced in the conventional wet etching process can be removed, effective light-receiving areas of a P node and an N node are increased and the photoelectric conversion efficiency can be improved; furthermore, the damage of the etching liquid medicine to the diffusing surface, which is caused by the problems of the splashing of the etching liquid medicine due to the rupture of bubbles in an etching slot, the drippage of etching liquid medicine drops coagulated above a slot body, unstable air exhaust, abnormal flow rate and the like, can be eliminated, so that the production proportion of various appearance unqualified slices to electric performance ineffective slices of the solar battery can be finally reduced.

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Patent Citations (1)

    Publication numberPublication dateAssigneeTitle
    CN-202004038-UOctober 05, 2011润峰电力有限公司多晶硅片水膜保护扩散面刻蚀装置

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Cited By (11)

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    CN-103606518-BApril 20, 2016英利集团有限公司湿法刻蚀方法及湿法刻蚀装置
    CN-103618020-AMarch 05, 2014浙江晶科能源有限公司, 晶科能源有限公司一种硅太阳能电池生产中的湿刻蚀方法
    CN-104409390-AMarch 11, 2015浙江晶科能源有限公司, 晶科能源有限公司硅片和湿法刻蚀系统
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    CN-105932113-BAugust 01, 2017苏州阿特斯阳光电力科技有限公司一种硅太阳能电池的湿法刻蚀方法及其使用的水膜溶液
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