一种用于计算机硬盘基片抛光的多孔纳米氧化铝抛光液

Porous nano-alumina polishing solution for polishing computer hard disk substrate

Abstract

The invention relates to a polishing solution for polishing a computer hard disk substrate, particularly for polishing a Ni-P-plated computer hard disk substrate, belonging to the technical field of manufacturing and surface polishing of computer storage hard disks. The polishing solution provided by the invention includes the following components in percentage by weight: 1-10wt% of a porous nano-alumina abrasive, 1-6wt% of an oxidant, 0.2-1.0wt% of a dispersant, 0.1-1wt% of a surfactant and the balance of water, and is characterized by containing the porous nano-alumina abrasive. Using the polishing solution to polish the hard disk substrate can reduce the surface roughness of the hard disk substrate. In the invention, the particle size and pore size of the porous nano-alumina respectively are 50-500 nm and 1-20 nm; and the oxidant is hydrogen peroxide, the dispersant is sodium hexametaphosphate, the surfactant is dodecyl polyoxyethylene ether and water is deionized water.
本发明涉及一种用于计算机硬盘基片的抛光液,特别是一种可用于Ni-P镀敷的计算机硬盘基片抛光,属于计算机存储器硬盘制造及表面抛光技术领域。本发明的抛光液含有多孔纳米氧化铝磨料、氧化剂、分散剂、表面活性剂和水,其特点在于该抛光液含有多孔纳米氧化铝磨料。本发明的多孔纳米氧化铝抛光液组成及其重量百分比如下:多孔纳米氧化铝磨料1~10%;氧化剂1~6%;分散剂0.2~1.0%;表面活性剂0.1~1%;余重为水。采用本发明提供的抛光液对硬盘基片进行抛光,可降低基片表面的粗糙度。多孔纳米氧化铝的粒径为50~500nm,孔径为1~20nm;氧化剂为双氧水,分散剂为六偏磷酸钠,表面活性剂为十二烷基聚氧乙烯醚,水采用去离子水。

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